Model 1510E Standalone

Measurement and Mapping Systems Process Monitoring & Quality Control for High Production Yields, efficiency, and maximize production uptime. Characterization of :

• All Compound Semiconductor materials (epi, annealed ion-implants on semi-insulating and some doped substrates)

• Silicon wafers (bulk Si, epi, annealed ion-implants, and POCl3 doping uniformity on high resistivity substrates)

• Thin film metallization (Contact factory for details) Measurement Capabilities

• Normal coil gap (>/= .035”/.889mm)

• Wafer sizes 2” (50mm) to 8” (200mm) wafers

• Manual loading

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